Low voltage-defect quantum cascade laser with heterogeneous injector regions

被引:12
作者
Hoffman, Anthony J. [1 ]
Schartner, Stephan
Howard, Scott S.
Franz, Kale J.
Towner, Fred
Gmachl, Claire
机构
[1] Princeton Univ, Dept Elect Engn, Princeton, NJ 08540 USA
[2] Vienna Univ Technol, Ctr Micro & Nanostruct, Vienna, Austria
[3] Maxion Tech Inc, College Pk, MD 20742 USA
来源
OPTICS EXPRESS | 2007年 / 15卷 / 24期
基金
奥地利科学基金会;
关键词
D O I
10.1364/OE.15.015818
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We demonstrate an In0.635Al0.356As/In0.678Ga0.322As strain compensated quantum cascade laser that employs heterogeneous injector regions for low voltage defect operation. The active core consists of interdigitated undoped and doped injectors followed by nominally identical wavelength optical transitions. The undoped injector regions are designed with reduced voltage defect while the doped injectors are of a more conventional design. The measured average voltage defect is less than 79 meV. At 80 K, a 2.3 mm long, back facet high reflectance coated laser has an emission wavelength of 4.7 mu m and outputs 2.3 W pulsed power with a peak wall-plug efficiency of 19%. (c) 2007 Optical Society of America.
引用
收藏
页码:15818 / 15823
页数:6
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