Diamond processing by focused ion beam-surface damage and recovery

被引：28

作者：

Bayn, I. ^{[1
,2
]}

Bolker, A. ^{[3
,4
]}

Cytermann, C. ^{[3
,4
]}

Meyler, B. ^{[1
,2
]}

Richter, V. ^{[3
,4
]}

Salzman, J. ^{[1
,2
]}

Kalish, R. ^{[3
,4
]}

机构：

[1] Technion Israel Inst Technol, Dept Elect Engn, IL-32000 Haifa, Israel

[2] Technion Israel Inst Technol, Microelect Res Ctr, IL-32000 Haifa, Israel

[3] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel

[4] Technion Israel Inst Technol, Inst Solid State, IL-32000 Haifa, Israel

来源：

APPLIED PHYSICS LETTERS | 2011年 / 99卷 / 18期

关键词：

SPINS;

D O I：

10.1063/1.3658631

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The nitrogen vacancy color center (NV-) in diamond is of great interest for photonic applications. Diamond nano-photonic structures are often implemented using focused-ion-beam (FIB) processing, leaving a damaged surface which has a detrimental effect on the color center luminescence. The FIB processing effect on single crystal diamond surfaces and their photonic properties is studied by time of flight secondary ion mass spectrometry and photoluminescence. Exposing the processed surface to hydrogen plasma, followed by chemical etching, drastically decreases implanted Ga concentration, resulting in a recovery of the NV- photo-emission and in a significant increase of the NV-/NV0 ratio. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3658631]

引用

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