Phase development in annealed zirconia-titania nanolaminates

被引:11
作者
DeLoach, JD
Shibilski, JJ
Crape, CR
Aita, CR
机构
[1] Univ Wisconsin, Adv Coatings Expt Lab, Milwaukee, WI 53201 USA
[2] Texas Instruments Inc, Dallas, TX 75243 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2000年 / 18卷 / 06期
关键词
D O I
10.1116/1.1319681
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Phase development was studied in sputter-deposited and annealed ZrO2-TiO2 nanolaminate films on fused silica substrates. The goal was to understand phase evolution as these structures moved toward thermodynamic equilibrium. The results show that diffusive amorphization to form alpha -ZTO was the first reaction of the as-deposited constituents at low temperature (700 degreesC). Growth of alpha -ZTO was self-limited, and a second metastable reaction product with an incommensurate alpha -PbO2-type lattice, alpha -ZTO, formed with time at temperature. Terminal phases formed only when the annealing temperature was raised to 1000 degreesC, thereby lifting kinetic constraints to diffusion. The terminal phases were ZrTiO4 or ZrTi2O6, depending upon film stoichiometry. This study demonstrates that in the absence of a physical driving force to promote layer registration upon low temperature annealing, constituents react to lower the system's free energy via a series of metastable phases that involve limited atomic rearrangement. Equilibrium phases are formed only after the kinetic constraints to diffusion are relaxed. (C) 2000 American Vacuum Society. [S0734-2101(00)05006-5].
引用
收藏
页码:2922 / 2927
页数:6
相关论文
共 58 条
[1]  
Aita C. R., 1998, Surface Engineering, V14, P421
[2]  
Aita C. R., 1992, Nanostructured Materials, V1, P269, DOI 10.1016/0965-9773(92)90034-U
[3]   Thermodynamics of tetragonal zirconia formation in a nanolaminate film [J].
Aita, CR ;
Wiggins, MD ;
Whig, R ;
Scanlan, CM ;
GajdardziskaJosifovska, M .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (02) :1176-1178
[4]   Properties of indium tin oxide films with indium tin modulation layers prepared by nano-scale controlled reactive magnetron sputtering [J].
Alam, AHMZ ;
Takashima, Y ;
Sasaki, K ;
Hata, T .
THIN SOLID FILMS, 1996, 279 (1-2) :131-134
[5]  
*ASTM JOINT COMM P, 1974, 40051 ASTM JOINT COM
[6]  
*ASTM JOINT COMM P, 1974, 17923 ASTM JOINT COM
[7]  
*ASTM JOINT COMM P, 1983, 340415 ASTM JOINT CO
[8]  
*ASTM JOINT COMM P, 1998, 461265 ASTM JOINT CO
[9]   CONTROL OF STRUCTURE AND ELECTRICAL-PROPERTIES OF LEAD-ZIRCONIUM-TITANATE-BASED FERROELECTRIC CAPACITORS PRODUCED USING A LAYER-BY-LAYER ION-BEAM SPUTTER-DEPOSITION TECHNIQUE [J].
AUCIELLO, O ;
GIFFORD, KD ;
KINGON, AI .
APPLIED PHYSICS LETTERS, 1994, 64 (21) :2873-2875
[10]   THE MICROSTRUCTURE AND DIELECTRIC-PROPERTIES OF ZR5TI7O24 CERAMICS [J].
AZOUGH, F ;
WRIGHT, A ;
FREER, R .
JOURNAL OF SOLID STATE CHEMISTRY, 1994, 108 (02) :284-290