AlGaInN high-power lasers grown on an ELO-GaN layer

被引:28
作者
Takeya, M
Yanashima, K
Asano, T
Hino, T
Ikeda, S
Shibuya, K
Kijima, S
Tojyo, T
Ansai, S
Uchida, S
Yabuki, Y
Aoki, T
Asatsuma, T
Ozawa, M
Kobayashi, T
Morita, E
Ikeda, M
机构
[1] Sony Shiroishi Semicond Inc, Shiroishi, Miyagi 9890734, Japan
[2] Sony Corp, Core Technol & Network Co, Semicond Laser Div, Semicond Co,Hodogaya Ku, Yokohama, Kanagawa 2400036, Japan
[3] Sony Corp, Tech Support Ctr, Environm & Anal Technol Dev, Hodogaya Ku, Yokohama, Kanagawa 2400036, Japan
关键词
ELO-GaN layer; wafer bending; X-ray diffraction (XRD); photoluminescence (PL); transmission electron microscopy (TEM);
D O I
10.1016/S0022-0248(00)00793-4
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Epitaxially laterally overgrown (ELO)-GaN substrates with dislocation-free regions can be prepared with a relatively small thickness using atmospheric pressure metal-organic chemical vapor deposition (MOCVD). In order to determine the effect of ELO-GaN layer on the reliability of blue-violet laser diodes (BV-LDs), we fabricated BV-LDs on the lateral-growth region of the ELO-GaN layer. The thickness of the ELO-GaN layer was maintained at 5 mum to inhibit wafer bending, so the total thickness of the BV-LDs was approximately 7 mum. The lifetime of the BV-LDs with a constant output power of 20 mW under CW operation at 25 degreesC was more than 500h. This lifetime is several times that of our conventional BV-LDs on sapphire substrates. The ELO-GaN layer was very effective in raising the lifetime of BV-LDs. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:646 / 651
页数:6
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