Atomic and electronic structure of the Si/SrTiO3 interface -: art. no. 125323

被引:114
作者
Zhang, X
Demkov, AA
Li, H
Hu, X
Wei, Y
Kulik, J
机构
[1] Motorola Inc, Phys Sci Res Labs, Tempe, AZ 85284 USA
[2] Motorola Inc, Semicond Prod Sector, Tempe, AZ 85284 USA
关键词
D O I
10.1103/PhysRevB.68.125323
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We predict theoretically the wetting conditions for the layer-by-layer growth of thin SrTiO3 (STO) films on Si. The result is in agreement with our recent experiments. The state of the art band offset calculations identify two different possibilities for the band alignment at the Si-STO interface. A very small conduction band offset is predicted for the structure without the chemically induced localization at the interface, and a 0.9 eV conduction band offset is predicted for the structure with chemically induced localized interface states.
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页数:6
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