Nanoimprint lithography patterns with a vertically aligned nanoscale tubular carbon structure

被引：16

作者：

Kim, Youn-Su

Lee, Kyeongmi

Lee, Jae Suk

Jung, Gun Young ^{[1
]}

Kim, Won Bae

机构：

[1] GIST, Dept Mat Sci & Engn, Kwangju 500712, South Korea

来源：

NANOTECHNOLOGY | 2008年 / 19卷 / 36期

关键词：

D O I：

10.1088/0957-4484/19/36/365305

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A nanoscale tubular carbon structure array was demonstrated as a mold for nanoimprint lithography (NIL), in which a vertically formed and hexagonally aligned nanoscale tubular carbon array was fabricated through carbon growth inside an anodic aluminum oxide (AAO) nanotemplate, followed by controlled chemical etching of the AAO layer. High density (over 10(10) cm(-2)) of the nanoscale carbon pillars with their controlled diameters and protruded lengths was inversely replicated onto a UV-curable resist for the first time using the imprinting lithography technique.

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页数：6

相关论文

共 24 条

[1] Electrochemical capacitors fabricated with carbon nanotubes grown within the pores of anodized aluminum oxide templates [J].

Ahn, HJ ;

Sohn, JI ;

Kim, YS ;

Shim, HS ;

Kim, WB ;

Seong, TY .

ELECTROCHEMISTRY COMMUNICATIONS, 2006, 8 (04) :513-516

[2]

Bae EJ, 2002, ADV MATER, V14, P277, DOI 10.1002/1521-4095(20020219)14:4<277::AID-ADMA277>3.0.CO

[3]

2-A

[4] Synthesis and magnetic properties of Fe3Pt nanowire arrays fabricated by electrodeposition -: art. no. 232506 [J].

Gao, JH ;

Zhan, QF ;

He, W ;

Sun, DL ;

Cheng, ZH .

APPLIED PHYSICS LETTERS, 2005, 86 (23) :1-3

[5]

Ge HX, 2005, NANO LETT, V5, P179, DOI 10.1012/nl048618k

[6] Nanoimprint lithography: Methods and material requirements [J].

Guo, L. Jay .

ADVANCED MATERIALS, 2007, 19 (04) :495-513

[7] Nano-imprint lithography using replicated mold by Ni electroforming [J].

Hirai, Y ;

Harada, S ;

Isaka, S ;

Kobayashi, M ;

Tanaka, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6B) :4186-4189

[8] Template-based carbon nanotubes and their application to a field emitter [J].

Jeong, SH ;

Hwang, HY ;

Lee, KH ;

Jeong, Y .

APPLIED PHYSICS LETTERS, 2001, 78 (14) :2052-2054

[9] Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface functionalization [J].

Jung, GY ;

Li, ZY ;

Wu, W ;

Ganapathiappan, S ;

Li, XM ;

Olynick, DL ;

Wang, SY ;

Tong, WM ;

Williams, RS .

LANGMUIR, 2005, 21 (14) :6127-6130

[10] Circuit fabrication at 17 nm half-pitch by nanoimprint lithography [J].

Jung, GY ;

Johnston-Halperin, E ;

Wu, W ;

Yu, ZN ;

Wang, SY ;

Tong, WM ;

Li, ZY ;

Green, JE ;

Sheriff, BA ;

Boukai, A ;

Bunimovich, Y ;

Heath, JR ;

Williams, RS .

NANO LETTERS, 2006, 6 (03) :351-354