Nano-crystalline filtered arc deposited (FAD) TiAlNPVD coatings for high-speed machining applications

The main advantage of the filtered arc deposition (FAD) technique is a significant grain refinement that leads to the formation of nano-crystalline (grain size approx. 60-80 nm) PVD coatings. This technique improves the wear resistance of FAD TiAlN coatings under high-speed machining conditions when cutting tool oxidation wear is dominant. A study of the surface structure characteristics of the FAD TiAlN coatings using SEM, EDS, TEM, AES, SIMS and EELFS was performed. The microhardness of the coatings were measured. The microstructure of the chips was analyzed. The compression of the chips as well as shear angle was measured. The friction parameter on the rake surface of the tools was determined in-situ. It was shown that the major cause of the high wear resistance of the FAD coatings during high-speed machining was the formation of the thin protective oxide films on the cutting tool surface. The grain size refinement of the coating promotes the formation of protective alumina films. These films are formed at the surface of nano-crystalline FAD TiAlN coating during high-speed machining. They mainly consist of protective alumina, whereas the films that are forming on the surface of TiAlN commercial coatings with coarser grains consist only of non-protective titania. The formation of the protective alumina films, composed of complicated amorphous-crystalline structures, significantly improves the friction and wear performance of coated tools. The tendency of the work piece material to adhere is reduced and considerably more heat is dissipated via chip removal. This is a major cause of the enhanced wear resistance of the FAD coating technique. Tribo-oxidation during cutting is a typical process of the self-organization of TiAlN coatings that results in a quasi-stabilization of cutting tool wear. The self-organization and friction control for coated cutting tools is considered based on a non-equilibrium thermodynamic approach. (C) 2003 Elsevier B.V. All rights reserved.