Monitoring the diffusion of vapour molecules in polymer films using SP-leaky-mode spectroscopy

被引:17
作者
Podgorsek, RP
Franke, H
Woods, J
Morrill, S
机构
[1] Gerhard Mercartor Univ, Appl Phys Lab, FB Angew Phys 10, D-47048 Duisburg, Germany
[2] Loctite Corp, Res Grp, Rocky Hill, CT 06067 USA
关键词
optical sensor; surface plasmon; leaky mode; diffusion coefficient; polymer films;
D O I
10.1016/S0925-4005(98)00172-5
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Vapour molecules that diffuse into a polymer film cause refractive index changes that lead to a signal in an optical sensor device. In a gas-sensor based on surface-plasmon-leaky-mode spectroscopy refractive index changes induce measurable resonance shifts in the reflectivity spectrum depending on the present vapour concentration. The measurement of the whole angular spectrum of a glass/metal/polymer multilayer system provides detailed information about the optical properties of the layers. Recording the resonance shifts with time leads to the dynamic behaviour of the diffusion process, i.e. the diffusion coefficient of the vapour molecule in the particular polymer can be determined. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:146 / 151
页数:6
相关论文
共 12 条
[1]  
Born M., 1986, PRINCIPLES OPTICS
[2]  
EROMOSELE IC, 1989, MAKROMOL CHEM, V190, P1613
[3]  
JOHNSTON DS, 1981, MACROMOL CHEM PHYS, V182, P393
[4]   A FIBEROPTIC CHEMICAL SENSOR-BASED ON SURFACE-PLASMON RESONANCE [J].
JORGENSON, RC ;
YEE, SS .
SENSORS AND ACTUATORS B-CHEMICAL, 1993, 12 (03) :213-220
[5]  
KNOLL W, 1993, INTEGRATED OPTICS MI, P89
[6]   OPTICAL GAS-DETECTION USING METAL-FILM ENHANCED LEAKY MODE SPECTROSCOPY [J].
OSTERFELD, M ;
FRANKE, H ;
FEGER, C .
APPLIED PHYSICS LETTERS, 1993, 62 (19) :2310-2312
[7]  
OSTERFELD M, 1993, APPL PHYS A, V58, P215
[8]  
Podgorsek R.P., 1997, SENSOR ACTUAT B-CHEM, V38-39, P349
[9]  
Trouillet A., 1996, Pure and Applied Optics, V5, P227, DOI 10.1088/0963-9659/5/2/006
[10]   VAPOR-DEPOSITION OF POLY(ALKYL-2-CYANOACRYLATE) RESIST COATINGS - A NEW ELECTRON-BEAM DEEP-ULTRA-VIOLET PHOTORESIST TECHNOLOGY [J].
WOODS, J ;
GUTHRIE, J ;
ROONEY, J ;
KELLY, L ;
DOYLE, A ;
NOONAN, E .
POLYMER, 1989, 30 (06) :1091-1098