Electrochemical corrosion and materials properties of reactively sputtered TiN/TiAlN multilayer coatings

被引:105
作者
Ananthakumar, R. [1 ]
Subramanian, B. [1 ,2 ]
Kobayashi, Akira [2 ]
Jayachandran, M. [1 ]
机构
[1] CSIR Cent Electrochem Res Inst, Karaikkudi 630006, Tamil Nadu, India
[2] Osaka Univ, Joining & Welding Res Inst, Osaka 5670047, Japan
基金
日本学术振兴会;
关键词
Films; Corrosion; Cutting tools; Wear parts; ALUMINUM-NITRIDE FILMS; TRIBOLOGICAL PROPERTIES; MECHANICAL-PROPERTIES; TIALN COATINGS; BEHAVIOR; TIN; MICROSTRUCTURE; HARDNESS; TIN/(TI; CRN;
D O I
10.1016/j.ceramint.2011.07.030
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
081705 [工业催化]; 082905 [生物质能源与材料];
摘要
TiN/TiAlN multilayers of 2 mu m thickness were successfully prepared by reactive DC magnetron sputtering method. XRD pattern showed the (111) preferential orientation for both TiN and TiAlN layers. XPS characterization showed the presence of different phases like TiN, TiO2, TiON, AlN and Al2O3. Cross sectional TEM indicated the columnar growth of the coatings. The average RMS roughness value of 4.8 nm was observed from AFM analysis. TiN/TiAlN coating showed lower friction coefficient and lower wear rate than single layer coatings. The results of electrochemical experiments indicated that a TiN/TiAlN multilayer coating has superior corrosion resistance in 3.5% NaCl solution. (C) 2011 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
引用
收藏
页码:477 / 485
页数:9
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