Solvated silylium cations: Structure determination by NMR spectroscopy and the NMR/Ab initio/IGLO method

被引:74
作者
Arshadi, M
Johnels, D
Edlund, U
Ottosson, CH
Cremer, D
机构
[1] UMEA UNIV, DEPT ORGAN CHEM, S-90187 UMEA, SWEDEN
[2] GOTHENBURG UNIV, DEPT THEORET CHEM, S-41296 GOTHENBURG, SWEDEN
关键词
D O I
10.1021/ja9542956
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Sixty R(3)SiX/solvent (S) and R(2)HSiX/S systems with R = methyl, ethyl, butyl and S = methylene chloride, DMPU, DMSO, sulfolane, HMPA, acetonitrile, pyridine, N-methylimidazole, and triethylamine were investigated with the help of NMR spectroscopy for different concentration ratios of R(3)SiX/S and R(2)HSiX/S as well as different temperatures. With the help of measured delta(29)Si and delta(13)C chemical shifts as well as (1)J(Si-C) and (2)J(Si-P) coupling constants, typical NMR parameters for R(3)SiX and R(2)HSiX, R(3)Si(S)(+), R(2)HSi(S)(+), and R(2)HSi(S)(2)(+) were established and discussed to distinguish between possible silylium cation-solvent complexes and equilibria between them. In addition, the NMR/ab initio/IGLO method (based on the continuum solvent model PISA and IGLO-PISA chemical shift calculations) was used to determine geometry, stability, and other properties of Me(3)Si(S)(n)(+) and Me(2)HSi(S)(n)(+) complexes in different solutions. NMR measurements and ab initio calculations clearly show that R(3)Si(S)(+) and R(2)HSi(S)(+) complexes with tetracoordinated Si are formed with solvents (S) more nucleophilic than methylene chloride while complexes with two S molecules and a pentacoordinated Si atom can only be found for R(3-n)H(n)Si(+) cations with n greater than or equal to 1. This is a result of internal (hyperconjugative) stabilization of R(3)Si(+) by alkyl groups and external stabilization by S coordination, as well as of steric factors involving R and S. Complex binding energies are in the range of 40-60 kcal/mol, which is significantly different from complex binding energies in the gas phase. In all cases investigated, (weakly) covalent bonds between Si and S are formed that exclude any silylium cation character for the solvated R(3)Si(+) and R(2)HSi(+) ions.
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收藏
页码:5120 / 5131
页数:12
相关论文
共 107 条
[71]   ELECTROSTATIC INTERACTION OF A SOLUTE WITH A CONTINUUM - A DIRECT UTILIZATION OF ABINITIO MOLECULAR POTENTIALS FOR THE PREVISION OF SOLVENT EFFECTS [J].
MIERTUS, S ;
SCROCCO, E ;
TOMASI, J .
CHEMICAL PHYSICS, 1981, 55 (01) :117-129
[72]   C-13 SPLITTINGS IN PROTON MAGNETIC RESONANCE SPECTRA .2. BONDING IN SUBSTITUTED METHANES [J].
MULLER, N ;
PRITCHARD, DE .
JOURNAL OF CHEMICAL PHYSICS, 1959, 31 (06) :1471-1476
[73]  
OLAH GA, 1994, SCIENCE, V263, P983
[74]   ORGANOMETALLIC CHEMISTRY .24. CONTINUED SEARCH FOR ELUSIVE PERSISTENT TRIVALENT ORGANOSILYL CATIONS - THE CLAIMED TRIMETHYLSILYL CATION REVISITED - ATTEMPTED PREPARATION OF CYCLIC AND HALOGEN-BRIDGED ORGANOSILICENIUM IONS [J].
OLAH, GA ;
RASUL, G ;
HEILIGER, L ;
BAUSCH, J ;
PRAKASH, GKS .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1992, 114 (20) :7737-7742
[75]   ORGANOMETALLIC CHEMISTRY .23. THE COVALENT NATURE OF TRIMETHYLSILYL PERCHLORATE AND OBSERVATION OF POLARIZED FLUOROTRIMETHYLSILANE-ANTIMONY PENTAFLUORIDE COMPLEXES BASED ON SI-29 NMR-STUDIES - DIFFICULTIES IN OBSERVING LONG-LIVED PERSISTENT TRIALKYLSILICENIUM IONS [J].
OLAH, GA ;
HEILIGER, L ;
LI, XY ;
PRAKASH, GKS .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1990, 112 (16) :5991-5995
[76]   TRISILYLOXONIUM IONS - PREPARATION, NMR-SPECTROSCOPY, AB-INITIO IGLO STUDIES, AND THEIR ROLE IN CATIONIC POLYMERIZATION OF CYCLOSILOXANES [J].
OLAH, GA ;
LI, XY ;
WANG, QJ ;
RASUL, G ;
PRAKASH, GKS .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1995, 117 (35) :8962-8966
[77]  
OLAH GA, 1995, B SOC CHIM FR, V132, P569
[78]   PROPERTIES OF R(3)SIX COMPOUNDS AND R(3)SI(+) IONS - DO SILYLIUM IONS EXIST IN SOLUTION [J].
OLSSON, L ;
OTTOSSON, CH ;
CREMER, D .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1995, 117 (28) :7460-7479
[79]   EVIDENCE FOR THE EXISTENCE OF SILYLIUM CATIONS IN CONDENSED PHASES [J].
OLSSON, L ;
CREMER, D .
CHEMICAL PHYSICS LETTERS, 1993, 215 (05) :433-443
[80]  
OLSSON LO, IN PRESS