共 18 条
[1]
BOHM C, 1993, REV SCI INSTRUM, V64, P31, DOI 10.1063/1.1144398
[2]
MULTIPOLE CONFINED DIFFUSION PLASMA PRODUCED BY 13.56 MHZ ELECTRODELESS SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (06)
:3345-3350
[6]
CONWAY GD, 1996, ANUPRLTR0296
[7]
DEGELING AW, 1996, PHYS PLASMAS, V3, P1070
[9]
DEPOSITION OF SILICON DIOXIDE FILMS USING THE HELICON DIFFUSION REACTOR FOR INTEGRATED-OPTICS APPLICATIONS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1994, 12 (05)
:2754-2761
[10]
HERSHKOWITZ N, 1996, COMMUNICATION