The microwave performance potential and status of device development of AlGaN/GaN HFETs is discussed. Microwave power amplifiers fabricated from these devices offer superior RF power performance particularly at elevated temperatures, relative to comparable components fabricated from GaAs metal semiconductors FETs or Si transistors. Devices are being developed for use in X-band radars, and RF performance is rapidly improving. The results show that HFET devices experience several physical effects that can limit performance.
机构:
Virginia Polytech Inst & State Univ, Dept Elect & Comp Engn, Blacksburg, VA 24061 USAVirginia Polytech Inst & State Univ, Dept Elect & Comp Engn, Blacksburg, VA 24061 USA
机构:
Virginia Polytech Inst & State Univ, Dept Elect & Comp Engn, Blacksburg, VA 24061 USAVirginia Polytech Inst & State Univ, Dept Elect & Comp Engn, Blacksburg, VA 24061 USA