Properties of amorphous GaN from first-principles simulations

被引:26
作者
Cai, B. [1 ]
Drabold, D. A. [1 ]
机构
[1] Ohio Univ, Dept Phys & Astron, Athens, OH 45701 USA
基金
美国国家科学基金会;
关键词
ELECTRICAL-PROPERTIES; PSEUDOPOTENTIALS; MICROCRYSTALLINE; DEPOSITION; FILMS;
D O I
10.1103/PhysRevB.84.075216
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Amorphous GaN (a-GaN) models are obtained from first-principles simulations. We compare four a-GaN models generated by "melt-and-quench" and the computer alchemy method. We find that most atoms tend to be fourfold, and a chemically ordered continuous random network is the ideal structure for a-GaN albeit with some coordination defects. Where the electronic structure is concerned, the gap is predicted to be less than 1.0 eV, underestimated as usual by a density functional calculation. We observe a highly localized valence tail and a remarkably delocalized exponential conduction tail in all models generated. Based upon these results, we speculate on potential differences in n- and p-type doping. The structural origin of tail and defect states is discussed. The vibrational density of states and dielectric function are computed and seem consistent with experiment.
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页数:6
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