The effect of pulsed magnetron sputtering on the properties of indium tin oxide thin films

被引：23

作者：

Hwang, MS

Lee, HJ

Jeong, HS

Seo, YW

Kwon, SJ

机构：

[1] ITM Inc, Dongan Ku, Anyang 431060, Kyunggi Do, South Korea

[2] Kyungwon Univ, Sujung Ku, Songnam 462701, Kyunggi Do, South Korea

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 171卷 / 1-3期

关键词：

transparent conducting oxide; indium tin oxide; pulsed magnetron sputtering; surface morphology;

D O I：

10.1016/S0257-8972(03)00231-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Flat panel displays based on flexible plastic substrates have received a lot of spotlights for their applications in mobile devices. However, it has been difficult to deposit high quality transparent conducting oxide thin films on plastic substrates due to their high process temperature. In this study we report on the properties of indium tin oxide (ITO) thin films prepared by DC and pulsed magnetron sputtering at low temperature. The ITO films were deposited on soda-lime glass substrates at low substrate temperatures of 70 and 120 degreesC. The electrical, structural, optical, and surface properties of the films prepared by DC and pulse magnetron sputtering were compared. We discuss the role of the pulse power in determining ITO thin film properties that are important in flat panel display applications. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：29 / 33

页数：5

共 6 条

[1]

CHANG S, 2002, J KOREAN I ELEECT EL, V15, P13

[2] Development of conductive transparent indium tin oxide (ITO) thin films deposited by direct current (DC) magnetron sputtering for photon-STM applications [J].