Rb deposition on TiSe2 and TiTe2 at 100 K and at room temperature studied by photoelectron spectroscopy -: art. no. 125403

被引:8
作者
Stoltz, SE [1 ]
Starnberg, HI
Holleboom, LJ
机构
[1] Univ Gothenburg, Dept Phys, SE-41296 Gothenburg, Sweden
[2] Chalmers, SE-41296 Gothenburg, Sweden
[3] Karlstad Univ, Dept Comp Sci, SE-65188 Karlstad, Sweden
关键词
D O I
10.1103/PhysRevB.71.125403
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The adsorption of Rb on TiSe2 and TiTe2 at 100 K was studied by high-resolution core level spectroscopy and low energy electron diffraction, At low coverage, Rb formed a dispersed phase, which condensed into a metallic phase as more Rb was deposited. Continued deposition resulted in layer-by-layer growth of Rb, which was particularly conspicuous on TiTe2. Most Of the Rb intercalated rapidly as the samples were allowed to warm up. For TiTe2, a small amount of intercalated Rb was detected already at 100 K. When room temperature was reached, only a small fraction of Rb remained on the surface. Equivalent results were obtained instantly when Rb was deposited at room temperature, and valence band spectra from these samples were in excellent agreement with band structures calculated by the linearized augmented plane wave method.
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页数:11
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