Tunnel-recombination currents and electroluminescence efficiency in InGaN/GaN LEDs

被引:28
作者
Bochkareva, NI [1 ]
Zhirnov, EA
Efremov, AA
Rebane, YT
Gorbunov, RI
Shreter, YG
机构
[1] Russian Acad Sci, Ioffe Physicotech Inst, St Petersburg 194021, Russia
[2] Univ Bath, Dept Phys, Bath BA2 7AY, Avon, England
[3] St Petersburg State Polytech Univ, St Petersburg 194251, Russia
关键词
D O I
10.1134/1.1923571
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The mechanism of injection loss in p-GaN/InGaN/n-GaN quantum-well LEDs is analyzed by studying the temperature and current dependences of external quantum efficiency in the temperature range 77-300 K and by measuring transient currents. The data obtained are interpreted in terms of a tunnel-recombination model of excess current, which involves electron tunneling through the potential barrier in n-GaN and the over-barrier thermal activation of holes in p-GaN. At a low forward bias, the dominant process is electron capture on the InGaN/p-GaN interface states. At a higher bias, the excess current sharply increases due to an increase in the density of holes on the InGaN/p-GaN interface and their recombination with the trapped electrons. The injection of carriers into the quantum well is limited by the tunnel-recombination current, which results in a decrease in efficiency at high current densities and low temperatures. The pinning of the Fermi level is attributed to the decoration of heterointerfaces, grain boundaries, and dislocations by impurity complexes. (c) 2005 Pleiades Publishing, Inc.
引用
收藏
页码:594 / 599
页数:6
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