Structure and properties of Ti-Al-Y-N coatings deposited from filtered vacuum-arc plasma

被引：35

作者：

Belous, V. A. ^{[1
]}

Vasyliev, V. V. ^{[1
]}

Goltvyanytsya, V. S.

Goltvyanytsya, S. K.

Luchaninov, A. A. ^{[1
]}

Reshetnyak, E. N. ^{[1
]}

Strel'nitskij, V. E. ^{[1
]}

Tolmacheva, G. N. ^{[1
]}

Danylina, O.

机构：

[1] Natl Sci Ctr, Kharkov Phys & Technol Inst, Kharkov, Ukraine

来源：

SURFACE & COATINGS TECHNOLOGY | 2011年 / 206卷 / 07期

关键词：

Coatings; Vacuum-arc; Filtered plasma; Nitrides; Titanium-aluminum; IMMERSION ION-IMPLANTATION; ALUMINUM NITRIDE FILMS; HARD COATINGS; CUTTING TOOLS; MICROSTRUCTURE; STRESS; TIALN;

D O I：

10.1016/j.surfcoat.2011.09.061

中图分类号：

TB3 [工程材料学];

学科分类号：

082905 [生物质能源与材料];

摘要：

Ti(0.5)Al(0.5)N coatings with a small amount of Y (up to 1 at.%) were deposited by filtered vacuum arc plasma at pulsed high voltage negative substrate bias potential with amplitude up to 2.5 kV and their microstructure was studied. X-ray fluorescence analysis showed that this deposition method allows ensuring well the conformity of the elemental composition of the metallic components of cathodes and films. X-ray diffraction measurements of the films with yttrium revealed a solid solution (Ti.Al)N phase with a cubic NaCl-type structure as the only crystalline phase. The films deposited with an amplitude of the substrate bias potential in the range of 1-1.5 kV were characterized by a strong axial texture [110] In these films an increase of the yttrium content leads to the reduction of the nitride lattice parameter and growth of coherent scattering zone dimension as well as to a decrease of the surface roughness. Coatings containing 1 at.% Y exhibited high hardness of 32-36 GPa and oxidation resistance. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：1720 / 1726

页数：7

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