A new photoresist based on calix[4]resorcinarene dendrimer

被引：87

作者：

Haba, O

Haga, K

Ueda, M ^{[1
]}

Morikawa, O

Konishi, H

机构：

[1] Yamagata Univ, Grad Sch Engn, Dept Human Sensing & Funct Sensor Engn, Yamagata 9928510, Japan

[2] Tottori Univ, Fac Engn, Dept Mat Sci, Tottori 6808552, Japan

来源：

CHEMISTRY OF MATERIALS | 1999年 / 11卷 / 02期

关键词：

D O I：

10.1021/cm980654v

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A new dendrimer (1), which contains phenol groups in the exterior for solubilization in aqueous alkaline solution and calix[4]resorcinarene in the interior to increase the molecular weight and number of the phenol group even in the lower generation, was designed as new negative-working, alkaline-developable photoresist material. A negative-working photoresist based on 1, 2,6-bis(hydroxymethyl)phenol as cross-linker, and diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate as a photoacid generator has been developed. This resist gave a clear negative pattern through postbaking at 110 degrees C after exposure to UV light, followed by developing with a 0.3% aqueous tetramethylammonium hydroxide solution at room temperature.

引用

页码：427 / 432

页数：6

共 12 条

[1]

ALLEN RD, 1995, P SOC PHOTO-OPT INS, V2438, P250, DOI 10.1117/12.210346

[2] PREPARATION OF POLYMERS WITH CONTROLLED MOLECULAR ARCHITECTURE - A NEW CONVERGENT APPROACH TO DENDRITIC MACROMOLECULES [J].