Highly stable amorphous-silicon thin-film transistors on clear plastic

被引:60
作者
Hekmatshoar, Bahman [1 ]
Cherenack, Kunigunde H.
Kattamis, Alex Z.
Long, Ke
Wagner, Sigurd
Sturm, James C.
机构
[1] Princeton Univ, Princeton Inst Sci & Technol Mat, Princeton, NJ 08544 USA
关键词
D O I
10.1063/1.2963481
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hydrogenated amorphous-silicon (a-Si:H) thin-film transistors (TFTs) have been fabricated on clear plastic with highly stable threshold voltages. When operated at a gate field of 2.5x10(5) V/cm, the threshold voltage shift extrapolated to only similar to 1.2 V after ten years. This stability is achieved by a high deposition temperature for the gate silicon nitride insulator which reduces charge trapping and high hydrogen dilution during a-Si:H growth to reduce defect creation in a-Si:H. This gate field of 2.5x10(5) V/cm is sufficient to drive phosphorescent organic light emitting diodes (OLEDs) at a brightness of 1000 Cd/m(2). The half-life of the TFT current is over ten years, slightly longer than the luminescence half-life of high quality green OLEDs.
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页数:3
相关论文
共 13 条
[11]   DEFECT POOL IN AMORPHOUS-SILICON THIN-FILM TRANSISTORS [J].
POWELL, MJ ;
VANBERKEL, C ;
FRANKLIN, AR ;
DEANE, SC ;
MILNE, WI .
PHYSICAL REVIEW B, 1992, 45 (08) :4160-4170
[12]  
VANBERKEL C, 1992, AMORPHOUS MICROCRYST, V2, P400
[13]   Integration of organic LED's and amorphous Si TFT's onto flexible and lightweight metal foil substrates [J].
Wu, CC ;
Theiss, SD ;
Gu, G ;
Lu, MH ;
Sturm, JC ;
Wagner, S ;
Forrest, SR .
IEEE ELECTRON DEVICE LETTERS, 1997, 18 (12) :609-612