Fabrication of intrinsic microcrystalline silicon thin films used for solar cells and its structure

Microcrystalline silicon thin films used for solar cells were, deposited at different silane concentrations and reaction pressures by VHF-PECVD. Study of materials structure was conducted by Raman spectra and x-ray diffraction. In tire range of experiment, microcrystalline silicon thin films prepared under different conditions all have ( 220) preferential orientation. Microcrystalline silicon solar cells with conversion efficiency up to 7. 1 % were fabricated. The structure of solar cells was glass/ZnO/p(mu c-Si; H)/ i(mu c-Si: H)/n(a-Si: H/Al). There was no Zno back reflector and the thickness of solar cells was only 1.2 mu m.