Reliable determination of kinetics parameters of adatoms in thin-film epitaxy

被引：2

作者：

Zhu, XD ^{[1
]}

机构：

[1] Univ Calif Davis, Dept Phys, Davis, CA 95616 USA

来源：

PHYSICAL REVIEW B | 1998年 / 58卷 / 16期

关键词：

D O I：

10.1103/PhysRevB.58.10975

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We show that in an interrupted step-flow epitaxy on a vicinal surface, the decay of adatom monomer density on terraces after deposition often has a simple dependence on the monomer diffusion coefficient D, the step-edge sticking probability S, and the extra step-edge energy barrier E-step (Schwoebel-Ehrlich barrier). One may reliably determine these kinetics parameters by examining the dependence of the decay rate constant on the average terrace width and the temperature. Such a decay can be monitored by either reflection high-energy electron diffraction or optical reflectance difference techniques. [S0163-1829(98)07840-0].

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页码：10975 / 10980

页数：6

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