Neutron diffraction study on the defect structure of indium-tin-oxide

被引:147
作者
González, GB
Cohen, JB
Hwang, JH
Mason, TO [1 ]
Hodges, JP
Jorgensen, JD
机构
[1] Northwestern Univ, Robert R McCormick Sch Engn & Appl Sci, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
关键词
D O I
10.1063/1.1341209
中图分类号
O59 [应用物理学];
学科分类号
摘要
The defect structure of undoped and Sn-doped In2O3 (ITO) materials was studied by preparing powders under different processing environments and performing neutron powder diffraction. The effect of tin doping and oxygen partial pressure was determined. Structural information was obtained by analyzing neutron powder diffraction data using the Rietveld method. The results include positions of the atoms, their thermal displacements, the fractional occupancy of the interstitial oxygen site, and the fractional occupancies of Sn on each of the two nonequivalent cation sites. The tin cations show a strong preference for the b site versus the d site. The measured electrical properties are correlated with the interstitial oxygen populations, which agree with the proposed models for reducible (2Sn(In)(.)O(i)")(x) and nonreducible (2Sn(In)(.)3O(O)O(i)")(x) defect clusters. (C) 2001 American Institute of Physics.
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页码:2550 / 2555
页数:6
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