Cathodic arc evaporation of (Ti,AI)N coatings and (Ti,AI)N/TiN multilayer-coatings-correlation between lifetime of coated cutting tools, structural and mechanical film properties

被引:59
作者
Weber, ER [1 ]
Fontaine, F
Scheib, M
Bock, W
机构
[1] G ELIT GmbH, D-13407 Berlin, Germany
[2] IFOS GmbH, D-67663 Kaiserslautern, Germany
关键词
wear resistance; arc technology; TiAlN; cutting tools; coating structure;
D O I
10.1016/j.surfcoat.2003.09.037
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
(Ti,Al)N and (TiAl)N/TiN multi-layer coatings were deposited by cathodic arc evaporation with a large area TiAl and/or Ti cathode. The ratio of Ti/Al varied between 50/50, 40/60 and 33/61. The goal was to determine the influence of the bias voltage, which varied between -30 and -125 V, on the lifetime of coated cutting tools under drilling conditions. Film orientation and compressive stress were determined by X-ray diffraction. The chemical composition of the coatings was investigated by secondary-neutral-mass spectrometry (SNMS). It was found, that in the multi-layer coatings, there is a transition in the texture from (2 0 0) to (1 0 0) with increasing negative bias voltage, beginning at approximately -75 V, while the monolayer retained (2 0 0) orientation. The stress in the monolayers reached a maximum at a bias voltage approximately -100 V. Rockwell and Scratch tests show excellent adhesion on carbide and steel materials. Multilayer tool lifetime reached a maximum at -100 V, while the monolayer coated tool life increased monotonically with negative bias. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:227 / 232
页数:6
相关论文
共 16 条
[11]   Advanced PVD-TiAlN coatings on carbide and cermet cutting tools [J].
Prengel, HG ;
Santhanam, AT ;
Penich, RM ;
Jindal, PC ;
Wendt, KH .
SURFACE & COATINGS TECHNOLOGY, 1997, 94-5 (1-3) :597-602
[12]   Wear mechanisms of (Ti1-xAlx)N coatings in dry drilling [J].
Tonshoff, K ;
Mohlfeld, A ;
Leyendecker, T ;
Fuss, HG ;
Erkens, G ;
Wenke, R ;
Cselle, T ;
Schwenck, M .
SURFACE & COATINGS TECHNOLOGY, 1997, 94-5 (1-3) :603-609
[13]  
Voigt W., 1910, LEHRBUCH KRISTALLPHY
[14]   DIRECT PLASMA BEAM DEPOSITION OF TIN(X) LAYERS WITH AN RF PLASMA BEAM SOURCE [J].
WEBER, FR ;
OECHSNER, H .
SURFACE & COATINGS TECHNOLOGY, 1993, 59 (1-3) :234-238
[15]   Phase transition and properties of Ti-Al-N thin films prepared by rf-plasma assisted magnetron sputtering [J].
Zhou, M ;
Makino, Y ;
Nose, M ;
Nogi, K .
THIN SOLID FILMS, 1999, 339 (1-2) :203-208
[16]  
1984, LANDOLDBORNSTEIN PHY, V18