Filling fraction limit for intrinsic voids in crystals: Doping in skutterudites

被引:188
作者
Shi, X [1 ]
Zhang, W
Chen, LD
Yang, J
机构
[1] Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
[2] Gen Motors R&D Ctr, Mat & Proc Lab, Warren, MI USA
关键词
D O I
10.1103/PhysRevLett.95.185503
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The doping limit or the filling fraction limit (FFL) of various impurities for the intrinsic voids in the lattice of CoSb3 is studied by the density functional method. The FFL is shown to be determined not only by the interaction between the impurity and host atoms but also by the formation of secondary phases between the impurity atoms and one of the host atoms. The predicted FFLs for Ca, Sr, Ba, La, Ce, and Yb in CoSb3 are in excellent agreement with reported experimental data. A correlation between the FFL of an impurity atom and its valence state and electronegativity is discovered.
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页数:4
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共 31 条
[21]  
Perdew JP, 1997, PHYS REV LETT, V78, P1396, DOI 10.1103/PhysRevLett.77.3865
[22]   SELF-INTERACTION CORRECTION TO DENSITY-FUNCTIONAL APPROXIMATIONS FOR MANY-ELECTRON SYSTEMS [J].
PERDEW, JP ;
ZUNGER, A .
PHYSICAL REVIEW B, 1981, 23 (10) :5048-5079
[23]   High temperature transport properties of partially filled CaxCo4Sb12 skutterudites [J].
Puyet, M ;
Lenoir, B ;
Dauscher, A ;
Dehmas, M ;
Stiewe, C ;
Müller, E .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (09) :4852-4855
[24]   Composition, structure, and stability of RuO2(110) as a function of oxygen pressure -: art. no. 035406 [J].
Reuter, K ;
Scheffler, M .
PHYSICAL REVIEW B, 2002, 65 (03) :1-11
[25]   A COMPARISON OF ELECTRONEGATIVITY SERIES [J].
SACHER, E ;
CURRIE, JF .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1988, 46 (02) :173-177
[26]   Thermoelectric properties of thallium-filled skutterudites [J].
Sales, BC ;
Chakoumakos, BC ;
Mandrus, D .
PHYSICAL REVIEW B, 2000, 61 (04) :2475-2481
[27]  
SHI X, IN PRESS
[28]  
Slack G. A., 1995, CRC HDB THERMOELECTR
[29]   First-principles surface phase diagram for hydrogen on GaN surfaces [J].
Van de Walle, CG ;
Neugebauer, J .
PHYSICAL REVIEW LETTERS, 2002, 88 (06) :4-066103
[30]   Microscopic origin of the phenomenological equilibrium "doping limit rule'' in n-type III-V semiconductors [J].
Zhang, SB ;
Wei, SH ;
Zunger, A .
PHYSICAL REVIEW LETTERS, 2000, 84 (06) :1232-1235