Microhardness of porous silicon films and composites

被引：37

作者：

Duttagupta, SP

Chen, XL

Jenekhe, SA

Fauchet, PM

机构：

[1] UNIV ROCHESTER,DEPT CHEM ENGN,ROCHESTER,NY 14627

[2] UNIV ROCHESTER,DEPT PHYS & ASTRON,ROCHESTER,NY 14627

[3] UNIV ROCHESTER,INST OPT,ROCHESTER,NY 14627

来源：

SOLID STATE COMMUNICATIONS | 1997年 / 101卷 / 01期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/S0038-1098(96)00546-7

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Microhardness measurements have been performed on porous silicon (PSi) films. The dependence of the hardness on porosity, morphology and the underlying silicon substrate has been established. A model which determines the intrinsic film hardness has been developed and experimentally validated. The load dependence of hardness was measured as an index of the disorder in porous silicon. Hardness analysis also provided information on the nature of the PSi surface. Finally, several PSi-polymer nanocomposites have been fabricated and characterized. An improvement in hardness is observed, with no apparent change in the PL characteristics. Copyright (C) 1996 Elsevier Science Ltd.

引用

页码：33 / 37

页数：5

共 17 条

[1] DETERMINATION OF LATTICE-PARAMETER AND ELASTIC PROPERTIES OF POROUS SILICON BY X-RAY-DIFFRACTION [J].