Fabrication of cobalt particles by ion beam-induced chemical vapor deposition (IBICVD)

被引：2

作者：

Kageyama, Y.

Lapicki, Adam

Suzuki, T.

机构：

[1] Toyota Technol Inst, Informat Storage Mat Lab, Tempaku Ku, Nagoya, Aichi 4688511, Japan

[2] Univ Notre Dame, Dept Chem & Biochem, Notre Dame, IN 46556 USA

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2004年 / 272卷

关键词：

cobalt; carbonyl; deposition; IBICVD; pattern formation;

D O I：

10.1016/j.jmmm.2003.12.202

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

A novel method for fabricating submicron-scale particles of cobalt utilizing dicobalt octacarbonyl precursor by localized ion beam-induced decomposition is presented. Patterns of metallic cobalt particles are fabricated through vector scan rastering. A brief discussion about the mechanism of the deposition is also presented. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：E1343 / E1344

页数：2

共 4 条

[1]

GADETSKY S, 1996, J APPL PHYS, V79, P5787

[2]

Ion beam induced chemical vapor deposition (IBICVD) of cobalt particles [J].