Perovskite Thin Films via Atomic Layer Deposition

被引：211

作者：

Sutherland, Brandon R. ^{[1
]}

Hoogland, Sjoerd ^{[1
]}

Adachi, Michael M. ^{[1
]}

Kanjanaboos, Pongsakorn ^{[1
]}

Wong, Chris T. O. ^{[1
]}

McDowell, Jeffrey J. ^{[1
]}

Xu, Jixian ^{[1
]}

Voznyy, Oleksandr ^{[1
]}

Ning, Zhijun ^{[1
]}

Houtepen, Arjan J. ^{[2
]}

Sargent, Edward H. ^{[1
]}

机构：

[1] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada

[2] Delft Univ Technol, Dept Chem Engn, NL-2628 BL Delft, Netherlands

来源：

ADVANCED MATERIALS | 2015年 / 27卷 / 01期

基金：

加拿大自然科学与工程研究理事会;

关键词：

SOLAR-CELLS; EFFICIENT; LENGTHS;

D O I：

10.1002/adma.201403965

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

(Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1. © 2014 Wiley-VCH Verlag GmbH & Co. KGaA.

引用

页码：53 / 58

页数：6

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