Electron-beam lithography patterning of magnetic nickel films

被引：10

作者：

Gerardino, A

Di Fabrizio, E

Nottola, A

Cabrini, S

Giannini, G

Mastrogiacomo, L

Gubbiotti, G

Candeloro, P

Carlotti, G

机构：

[1] CNR, IESS, Ist Elettron Stato Solido, I-00156 Rome, Italy

[2] INFM, TASC, I-43100 Trieste, Italy

[3] Univ Perugia, Dipartimento Fis, INFM, I-06100 Perugia, Italy

来源：

MICROELECTRONIC ENGINEERING | 2001年 / 57-8卷

关键词：

D O I：

10.1016/S0167-9317(01)00474-9

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Electron beam (e-beam) lithography has been used to fabricate arrays of rectangular and triangular shaped nickel dots. Dot dimensions range from 250 nm to 1 mum with separations of sub 100, 100 and 250 nm. The array dimensions are about I mm(2). X-ray masks to perform the dot patterning by X-ray lithography have been fabricated too. The whole lithographic process is described together with preliminary results concerning the magnetic characterisation of the patterned structures. (C) 2001 Elsevier Science BY All rights reserved.

引用

页码：931 / 937

页数：7

共 9 条

[1]

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[2]

BLAND JAC, 1994, ULTRATHIN MAGNETIC F, V2

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