Temperature effects on copper diffusion in natural chalcocite

被引：16

作者：

Pauporté, T ^{[1
]}

Vedel, J ^{[1
]}

机构：

[1] Ecole Natl Super Chim Paris, Lab Electrochim & Chim Analyt, CNRS, UMR 7575, F-75231 Paris, France

来源：

SOLID STATE IONICS | 1999年 / 116卷 / 3-4期

关键词：

chalcocite; diffusion of copper; temperature effects;

D O I：

10.1016/S0167-2738(98)00353-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Two samples of chalcocite with compositions Cu1.9984S and Cu-1.9962 were studied. They were first characterised by electrochemical, electrical and X-ray diffraction measurements. For the monoclinic gamma-phase, the variations with temperature and composition of the chemical diffusion coefficient of copper in these mixed conductors were investigated using two different methods: measurements of the time dependence of the resistance change of the samples after application of a small dc voltage at an ion blocking microelectrode (between room temperature and approximate to 100 degrees C) and electrochemical impedance spectroscopy (EIS) between room temperature and 58 degrees C. The chalcocite hexagonal beta-phase (>100 degrees C) was studied using a microelectrode, showing a small decrease of (D) over tilde(Cu) at the phase change. (C) 1999 Published by Elsevier Science B.V. All rights reserved.

引用

页码：311 / 320

页数：10