Microstructure and optical properties of photoactive TiO2:N thin films

被引：46

作者：

Brudnik, A. ^{[2
]}

Bucko, M. ^{[1
]}

Radecka, M. ^{[1
]}

Trenczek-Zajac, A. ^{[1
]}

Zakrzewska, K. ^{[2
]}

机构：

[1] AGH Univ Sci & Technol, Fac Mat Sci & Ceram, PL-30059 Krakow, Poland

[2] AGH Univ Sci & Technol, Fac Elect Engn Automat Comp Sci & Elect, PL-30059 Krakow, Poland

来源：

VACUUM | 2008年 / 82卷 / 10期

关键词：

photocatalysis; titanium dioxide doped with nitrogen; magnetron sputtering; optical properties;

D O I：

10.1016/j.vacuum.2008.01.020

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

In this work, we have chosen oxidation of TiN thin films as a feasible method for preparation of nitrogen-doped titanium dioxide thin films, TiO2:N, for photocatalytic applications. DC reactive magnetron sputtering with the plasma emission control wads used for deposition of stoichiometric TiN thin films. The microstructure and chemical composition of films before and after oxidation were investigated by means of RBS, X-ray diffraction (XRD) in grazing incidence diffraction (GID) configuration, AFM and XPS techniques. The electrical conductivity was measured by the van der Pauw method as a function of the oxidation temperature. The optical transmittance and reflectance spectra of the films were measured over the visible and UV ranges of the light spectrum. GID diffraction patterns of as-sputtered TiN thin films and those after oxidation indicate that TiO2 rutile is formed at around 300 degrees C. Nitrogen is still present as indicated by XPS studies even when XRD detects the rutile only. Optical absorption of thin films oxidized at 450 degrees C is shifted towards the visible range of the light spectrum. (C) 2008 Elsevier Ltd. All rights reserved.

引用

页码：936 / 941

页数：6

共 25 条

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