Parallel scanning AFM with on-chip circuitry in CMOS technology

被引:25
作者
Lange, D [1 ]
Akiyama, T [1 ]
Hagleitner, C [1 ]
Tonin, A [1 ]
Hidber, HR [1 ]
Niedermann, P [1 ]
Staufer, U [1 ]
de Rooij, NF [1 ]
Brand, O [1 ]
Baltes, H [1 ]
机构
[1] ETH Honggerberg, Phys Elect Lab, CH-8093 Zurich, Switzerland
来源
MEMS '99: TWELFTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST | 1999年
关键词
D O I
10.1109/MEMSYS.1999.746870
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
We present the first force sensors for application in Atomic Force Microscopy (AFM) fabricated with industrial CMOS technology. Sensing is based on two different detection schemes: a piezoresistive Wheatstone bridge and stress-sensing MOS transistors. The system combines on a single chip (i) two cantilevers for parallel scanning, (ii) thermal actuators for independent deflection of the two cantilevers, (iii) sensors to measure the deflection, and (iv) offset compensation and signal conditioning circuitry. The AFM probes were tested in contact and dynamic mode. In the dynamic mode, images with a resolution of better than 20 Angstrom, were recorded. Moreover, we successfully took parallel scanning images in contact, mode.
引用
收藏
页码:447 / 452
页数:6
相关论文
共 10 条
  • [1] Characterization of an integrated force sensor based on a MOS transistor for applications in scanning force microscopy
    Akiyama, T
    Tonin, A
    Hidber, HR
    Brugger, J
    Vettiger, P
    Staufer, U
    de Rooij, NF
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 1998, 64 (01) : 1 - 6
  • [2] AKIYAMA T, IN PRESS J MICRO MAR
  • [3] Micromachined thermally based CMOS microsensors
    Baltes, H
    Paul, O
    Brand, O
    [J]. PROCEEDINGS OF THE IEEE, 1998, 86 (08) : 1660 - 1678
  • [4] HAGLEITNER C, 1999, SPIE SMART STRUCT MA
  • [5] CMOS chemical microsensors based on resonant cantilever beams
    Lange, D
    Koll, A
    Brand, O
    Baltes, H
    [J]. SMART STRUCTURES AND MATERIALS 1998: SMART ELECTRONICS AND MEMS, 1998, 3328 : 233 - 243
  • [6] Lutwyche M, 1998, MICRO ELECTRO MECHANICAL SYSTEMS - IEEE ELEVENTH ANNUAL INTERNATIONAL WORKSHOP PROCEEDINGS, P8, DOI 10.1109/MEMSYS.1998.659720
  • [7] Centimeter scale atomic force microscope imaging and lithography
    Minne, SC
    Adams, JD
    Yaralioglu, G
    Manalis, SR
    Atalar, A
    Quate, CF
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (12) : 1742 - 1744
  • [8] Industrial fabrication method for arbitrarily shaped silicon N-well micromechanical structures
    Muller, T
    Feichtinger, T
    Breitenbach, G
    Brandl, M
    Brand, O
    Baltes, H
    [J]. MICRO ELECTRO MECHANICAL SYSTEMS - IEEE ELEVENTH ANNUAL INTERNATIONAL WORKSHOP PROCEEDINGS, 1998, : 240 - 245
  • [9] CVD diamond probes for nanotechnology
    Niedermann, P
    Hanni, W
    Morel, D
    Perret, A
    Skinner, N
    Indermuhle, PF
    de Rooij, NF
    Buffat, PA
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1998, 66 (Suppl 1): : S31 - S34
  • [10] NIEDERMANN P, IN PRESS SURFACE INT