Formation of a rectifier with gold nanoclusters: X-ray reflectivity and atomic force microscopy measurements

被引:13
作者
Pal, S
Sanyal, MK
John, NS
Kulkarni, GU
机构
[1] Saha Inst Nucl Phys, Surface Phys Div, Kolkata 700064, W Bengal, India
[2] Jawaharlal Nehru Ctr Adv Sci Res, Chem & Phys Mat Unit, Bangalore 560064, Karnataka, India
关键词
D O I
10.1103/PhysRevB.71.121404
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We demonstrate that monolayer and bilayer films of thiol-capped gold nanoclusters can exhibit prominent rectification properties, provided spatial asymmetry exists between the two tunnel junctions used to connect the nanoclusters. Systematic x-ray reflectivity and atomic force microscopy (AFM) measurements were carried out to characterize the spatial asymmetry introduced by a monolayer of fatty acid salt used to deposit thiol-capped gold nanoclusters on a hydrophilic SiO2-Si(001) substrate using the Langmuir-Blodgett technique. Current-voltage characteristics, obtained from conducting probe AFM measurements, show rectification ratios of 13.5 and 364.8 for the monolayer and bilayer films, respectively.
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页数:4
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