Simulation of a quantum-dot flash memory

被引:27
作者
Iannaccone, G
Trellakis, A
Ravaioli, U [1 ]
机构
[1] Univ Illinois, Beckman Inst, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
[3] Univ Pisa, Dipartimento Ingn Informaz Elettron Informat & Te, I-56126 Pisa, Italy
关键词
D O I
10.1063/1.368750
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present the simulation of a flash memory in which the floating gate is replaced by a silicon quantum dot. Unlike conventional flash memories, this device promises the advantage of self-limited direct charging of the floating gate with a low writing voltage,thus allowing one to overcome hot carrier degradation problems. Due to the small dimensions of this memory device, quantum effects are expected to play an important role. To estimate their magnitude, we compare a semiclassical simulation based on the solution of Poisson's equation with a quantum computation solving the complete system of Schrodinger's and Poisson's equation. Despite the three-dimensional nature of the problem, a two-dimensional computational mesh proved to be sufficient to provide good agreement with experimental results, after three-dimensional corrections were included. (C) 1998 American Institute of Physics. [S0021-8979(98)06221-5].
引用
收藏
页码:5032 / 5036
页数:5
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