Structural and electrical properties of zinc oxides thin films prepared by thermal oxidation

被引：50

作者：

Girtan, Mihaela ^{[1
,2
]}

Rusu, G. G. ^{[2
]}

Dabos-Seignon, Sylvie ^{[1
]}

Rusu, Mihaela ^{[2
]}

机构：

[1] Univ Angers, Dept Phys, F-49045 Angers, France

[2] Alexandru Ioan Cuza Univ, Fac Phys, Iasi 700506, Romania

来源：

APPLIED SURFACE SCIENCE | 2008年 / 254卷 / 13期

关键词：

vacuum deposition; ZnO; thin films; XRD; electrical conductivity;

D O I：

10.1016/j.apsusc.2007.12.055

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report on zinc oxide (ZnO) thin films (d = 55-120 nm) prepared by thermal oxidation, at 623 K, of metallic zinc films, using a flash-heating method. Zinc films were deposited in vacuum by quasi-closed volume technique onto unheated glass substrates in two arrangements: horizontal and vertical positions relative to incident vapour. Depending on the preparation conditions, both quasi-amorphous and (0 0 2) textured polycrystalline ZnO films were obtained. The surface morphologies were characterized by atomic force microscopy and scanning electron microscopy. By in situ electrical measurements during two heating-cooling cycles up to a temperature of 673 K, an irreversible decrease of electrical conductivity of as flash-oxidized Zn films was revealed. The influence of deposition arrangement and oxidation conditions on the structural, morphological and electrical properties of the ZnO films is discussed. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：4179 / 4185

页数：7

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