Laser annealing of sapphire with implanted copper nanoparticles

被引:27
作者
Stepanov, AL [1 ]
Kreibig, U
Hole, DE
Khaibullin, RI
Khaibullin, IB
Popok, VN
机构
[1] Russian Acad Sci, Kazan Phys Tech Inst, Lab Radiat Phys, Sibirsky Trakt 1017, Kazan 420029, Russia
[2] Rhein Westfal TH Aachen, Inst Phys 1, Rhein Westfal TH Aachen, D-52056 Aachen, Germany
[3] Univ Sussex, Sch Engn, Brighton BN1 9QH, E Sussex, England
[4] Univ Gothenburg, Dept Phys & Engn Phys, S-41296 Gothenburg, Sweden
[5] Chalmers Univ Technol, S-41296 Gothenburg, Sweden
[6] Belarusian State Univ, Dept Phys, Minsk 220050, BELARUS
关键词
ion implantation; nanoparticles; laser annealing; optical reflectance;
D O I
10.1016/S0168-583X(01)00508-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Copper nanoparticles have been synthesized by ion implantation in sapphire at 40 keV to a dose of 1 x 10(17) ion/cm(2), at a current density from 2.5 to 12.5 muA/cm(2). The samples were treated using pulses of a high-power KrF excimer laser (248 nm) in ambient atmosphere. This employed a single (25 ns) pulse fluence of 0.3 J/cm(2) for Cu-implanted sapphires. Number of pulses of the same energy density and at a frequency of 1 Hz were accumulated in the same area on the surface. The formation and modification of metal nanoparticles were assessed via optical reflectance. Generally, changes induced by laser pulses suggest that there are reductions of the size of the nanoparticles without diffusion of metal atoms inward the sapphire. No evidence for oxidization of Cu nanoparticles was founded. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:120 / 125
页数:6
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