Nanoindentation studies on amorphous carbon nitride thin films prepared by shielded arc ion plating

被引：14

作者：

Takai, O ^{[1
]}

Tajima, N ^{[1
]}

Saze, H ^{[1
]}

Sugimura, H ^{[1
]}

机构：

[1] Nagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2001年 / 142卷

关键词：

amorphous carbon; amorphous carbon nitride; nanoindentation; shielded arc ion plating;

D O I：

10.1016/S0257-8972(01)01175-6

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Three types of amorphous carbon-based thin films, a-C:N, a-C:Ar and a-C:N:Ar thin films, were prepared by shielded arc ion plating (SAIP) at various substrate bias voltages. SAIP uses a shielding plate set between target and substrate, which traps macroparticles flowing from the target and avoids their deposition on the substrate. This simple shielding method results in smooth surfaces of the deposited films. Nanohardness and nano-wear-resistance of these synthesized films were measured with a nanoindentation system. The a-C:Ar films were the hardest, possessing maximum hardness of 35 GPa. The a-C:N films and a-C:N:Ar films showed excellent wear resistance. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：719 / 723

页数：5

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