Electron-beam microcolumn fabrication and testing

被引:13
作者
Despont, M
Staufer, U
Stebler, C
Gross, H
Vettiger, P
机构
[1] IBM Research Division, Zurich Research Laboratory, 8803 Rüschlikon
关键词
D O I
10.1016/0167-9317(95)00197-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we report the improvement of a process for full microfabrication of miniaturized electron lenses specially design for low-energy (100 eV) lithography tools. The main advantages of this technique are the following. It is batch processing oriented, meaning that lenses can be easily built in a full wafer fabrication. With this procedure it is possible to develop a completely integrated process for machining arrays of lenses. Lens bores are aligned using an electron lithography process, resulting in highly accurate positioning. Finally, the source lens chip has not only one but several sets of lenses with different aperture sizes, each producing a different beam diameter. A scheme is proposed with which the appropriate lens can be selected by means of a deflection system.
引用
收藏
页码:69 / 72
页数:4
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