Photochemical pattern transfer and enhancement of thin film silica mesophases

Here we present a spatially directed calcination approach based on masked UV exposure to pattern mesoporous regions within a mesostructured matrix in a rapid, single-step, and inexpensive manner. Subsequent chemical treatment of the film can selectively remove the mesostructured regions, leading to patterned mesoporous structures. Such tunability in the processing under near room-temperature conditions allows for spatial control and patterning of function related to optical properties, topology, porosity, hydrophobicity, and structural morphology of the mesoscopic thin film material on a wide range of substrates.