Measurement of interfacial fracture toughness under combined mechanical and thermal stresses

被引:27
作者
Jiao, J
Gurumurthy, CK
Kramer, EJ
Sha, Y
Hui, CY
Borgesen, P
机构
[1] Motorola Inc, Automot & Ind Elect Grp, Northbrook, IL 60062 USA
[2] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[3] Intel Corp, Chandler, AZ 85226 USA
[4] Cornell Univ, Theoret & Appl Mech Dept, Ithaca, NY 14850 USA
[5] Universal Instruments Corp, Binghamton, NY 13902 USA
关键词
D O I
10.1115/1.2792645
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The interfacial fracture resistance of a polyimide passivation/underfill interface was measured using an asymmetric double cantilever beam technique. A thin layer of polyimide was coated on a standard epoxy as one of the beams and an underfill was flowed over the polyimide film and cured to form the second beam. The relative contributions of the thermal and mechanical stress were systematically varied by varying the thickness ratio of the two beams. The results indicate that the effect of thermal residual stress must be taken into account in the calculation of critical strain energy release rate to obtain the interfacial fracture energy.
引用
收藏
页码:349 / 353
页数:5
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