Tailored Ag nanoparticle array fabricated by block copolymer photolithography

被引：30

作者：

Li, Jingze ^{[1
]}

Kamata, Kaori ^{[1
,2
]}

Iyoda, Tomokazu ^{[1
,2
]}

机构：

[1] Tokyo Inst Technol, Chem Resources Lab, Div Integrated Mol Engn, Kanagawa 2268503, Japan

[2] Japan Sci & Technol, CREST, Kawaguchi, Saitama 3320012, Japan

来源：

THIN SOLID FILMS | 2008年 / 516卷 / 09期

基金：

日本学术振兴会;

关键词：

block copolymer; photolithography; periodic array; plasmonic;

D O I：

10.1016/j.tsf.2007.04.126

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Periodic arrays of metallic Ag nanoparticles have been fabricated on various solid substrates for the potential application in nano-electronics and nano-photonics by block copolymer photolithography. Spin-coated diblock copolymer thin film with well-ordered and vertically oriented cylindrical nanodomains was utilized as the template. Ag+ was selectively doped in the cylindrical nanodomain by just placing a few drops of AgNO3 aqueous solution on the film. Both photochemical reduction of Ag+ to metallic Ag and concomitant photo-etching of the diblock copolymer template have been achieved under vacuum ultraviolet light irradiation, resulting in a direct transcription of the periodic pattern of diblock copolymer template to the metallic Ag nanoparticle array with the consistent periodicity. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：2577 / 2581

页数：5

共 25 条

[1] Defect-free nanoporous thin films from ABC triblock copolymers [J].

Bang, Joona ;

Kim, Seung Hyun ;

Drockenmuller, Eric ;

Misner, Matthew J. ;

Russell, Thomas P. ;

Hawker, Craig J. .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2006, 128 (23) :7622-7629

[2] Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication [J].

Black, CT ;

Guarini, KW ;

Milkove, KR ;

Baker, SM ;

Russell, TP ;

Tuominen, MT .

APPLIED PHYSICS LETTERS, 2001, 79 (03) :409-411

[3]

Cheng JY, 2001, ADV MATER, V13, P1174, DOI 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO

[4]

2-Q

[5] Synthesis and optical properties of silver nanoparticles and arrays [J].

Evanoff, DD ;

Chumanov, G .

CHEMPHYSCHEM, 2005, 6 (07) :1221-1231

[6] Patterning: Principles and some new developments [J].

Geissler, M ;

Xia, YN .

ADVANCED MATERIALS, 2004, 16 (15) :1249-1269

[7] Nanostructure fabrication using block copolymers [J].

Hamley, IW .

NANOTECHNOLOGY, 2003, 14 (10) :R39-R54

[8] Reducing substrate pinning of block copolymer microdomains with a buffer layer of polymer brushes [J].

Harrison, C ;

Chaikin, PM ;

Huse, DA ;

Adamson, DH ;

Daniel, A ;

Huang, E ;

Mansky, P ;

Russell, TP ;

Hawker, CJ ;

Egolf, DA ;

Melnikov, IV ;

Bodenschatz, E .

MACROMOLECULES, 2000, 33 (03) :857-865

[9] Mechanics of molecular assembly: Real-time and in-situ analysis of nano-to-mesoscopic scale hierarchical structures and nonequilibrium phenomena [J].

Hashimoto, T .

BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 2005, 78 (01) :1-39

[10] Nanoporous gold films created using templates formed from self-assembled structures of inorganic-block copolymer micelles [J].

Haupt, M ;

Miller, S ;

Glass, R ;

Arnold, M ;

Sauer, R ;

Thonke, K ;

Möller, M ;

Spatz, JP .

ADVANCED MATERIALS, 2003, 15 (10) :829-+

← 1 2 3 →