Filamentation and damage in fused silica induced by tightly focused femtosecond laser pulses

被引:344
作者
Couairon, A [1 ]
Sudrie, L
Franco, M
Prade, B
Mysyrowicz, A
机构
[1] Ecole Polytech, CNRS, UMR 7644, Ctr Phys Theor, F-91128 Palaiseau, France
[2] Ecole Polytech, CNRS, UMR 7639,Ecole Natl Super Tech Avancees, Lab Opt Appl, F-91761 Palaiseau, France
来源
PHYSICAL REVIEW B | 2005年 / 71卷 / 12期
关键词
D O I
10.1103/PhysRevB.71.125435
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
We investigate experimentally and numerically the damage tracks induced by tightly focused (NA=0.5) infrared femtosecond laser pulses in the bulk of a fused silica sample. Two types of irreversible damage are observed. The first damage corresponds to a permanent change of refractive index-without structural modifications (type I). It appears for input pulse energies beyond 0.1 μ J. It takes the form of a narrow track extending over more than 100 μ m at higher input powers. It is attributed to a change of the polarizability of the medium, following a filamentary propagation which generates an electron-hole plasma through optical field ionization. A second type of damage,occurs for input pulse energies beyond 0.3 μ J (type II). It takes the form of a pear-shaped structural damage associated with an electron-ion plasma triggered by avalanche. The temporal evolution of plasma absorption is studied by pump-probe experiments. For type I damage, a fast electron-hole recombination is observed. Type II damage is linked with a longer absorption.
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页数:11
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