Magnetic and hardness properties of nanostructured Ni-Co films deposited by a nonaqueous electroless method

被引：43

作者：

Chow, GM

Ding, J

Zhang, J

Lee, KY

Surani, D

Lawrence, SH

机构：

[1] Natl Univ Singapore, Dept Mat Sci, Singapore 117600, Singapore

[2] USN, Res Lab, Washington, DC 20375 USA

来源：

APPLIED PHYSICS LETTERS | 1999年 / 74卷 / 13期

关键词：

D O I：

10.1063/1.123703

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nanostructured NixCo100-x films were deposited on Cu substrates by reducing the constituent metal salts in refluxing ethylene glycol at 194 degrees C. The average crystallite size increased with x, and reached a maximum of 64 nm when x = 100. The coercivity H (c) of the films measured in the direction perpendicular (perpendicular to) to the plane of the film was higher than that in the parallel (parallel to) direction. For the sample of x = 50, H (c perpendicular to) was 379 Oe, which was six times that of H (c parallel to.) Saturation magnetization M (s) in the film plane was 1016 emu/cm(3), and the remanent magnetization M (r) 636 emu/cm(3), giving a squareness ratio of 0.63. This film also had a Vickers hardness of 193. (C) 1999 American Institute of Physics.

引用

页码：1889 / 1891

页数：3

共 14 条

[1] REENTRANT MAGNETIC-BEHAVIOR IN FCC CO-CU ALLOYS [J].