Simulation of electron trajectories of Wien filter for high-resolution EELS installed in TEM

被引:21
作者
Tsuno, K [1 ]
Rouse, J [1 ]
机构
[1] MUNROS ELECTRON BEAM SOFTWARE LTD,LONDON SW7 4AN,ENGLAND
来源
JOURNAL OF ELECTRON MICROSCOPY | 1996年 / 45卷 / 05期
关键词
Wien filter; EELS; electron trajectory; field calculation; aberration;
D O I
10.1093/oxfordjournals.jmicro.a023460
中图分类号
TH742 [显微镜];
学科分类号
摘要
Electric and magnetic field distributions followed by electron trajectories of Wien filters with eight poles were calculated numerically. Both the electric deflection and magnetic deflection fields had exactly the same distribution even at the fringing field region. This confirms the achievement of a perfectly straight optical axis of the Wien filter (the Wien condition). The stigmator component of electric field distribution is different from the deflection field distribution at the fringing region. This difference causes residual astigmatism. However, the astigmatism can easily be corrected by a slight increase of the quadrupole field strength. It is possible to reduce the number of power supplies by connecting a few electrodes at the same voltage. This connection causes the appearance of third-order aberrations due to the octupole electric field component. Further reduction of the power supplies is possible by connecting the vertical poles to the cramp electrically. In this case, however, an additional accelerating potential appears, and this potential causes a slight deviation from the Wien condition. The reduction of power supplies does not give so serious an effect on the energy resolution because the beam is distorted but its size is not enlarged excessively.
引用
收藏
页码:417 / 427
页数:11
相关论文
共 13 条
[1]  
Ioanoviciu D., 1973, International Journal of Mass Spectrometry and Ion Physics, V11, P169, DOI 10.1016/0020-7381(73)80009-9
[2]   A spin rotator for detecting all three magnetization vector components by spin-polarized scanning electron microscopy [J].
Kohashi, T ;
Matsuyama, H ;
Koike, K .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1995, 66 (12) :5537-5543
[3]  
LIEU XD, 1995, NUCL INSTRUM METH A, V363, P254
[4]  
NICHLAUS M, 1993, PHYS REV A, V48, P152
[5]  
ROSE H, 1987, OPTIK, V77, P26
[6]   3-DIMENSIONAL COMPUTER MODELING OF ELECTROSTATIC AND MAGNETIC ELECTRON-OPTICAL COMPONENTS [J].
ROUSE, J ;
MUNRO, E .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1891-1897
[7]  
SCHEINFEIN MR, 1989, OPTIK, V82, P99
[8]   EXB MASS-SEPARATOR DESIGN [J].
SELIGER, RL .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (05) :2352-&
[9]  
TANAKA M, 1992, P 50 ANN M EL MICR S, P940
[10]  
TANG TT, 1986, OPTIK, V74, P51