Electron field emission from a patterned diamondlike carbon flat cathode

被引：9

作者：

Mao, DS ^{[1
]}

Zhao, J

Li, W

Ran, CX

Wang, X

Liu, XH

Zhou, JY

Fan, Z

Zhu, YK

Li, Q

Xu, JF

机构：

[1] Acad Sinica, Shanghai Inst Met, Ion Beam Lab, Shanghai 200050, Peoples R China

[2] E China Normal Univ, Dept Elect Sci & Technol, Shanghai 200062, Peoples R China

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 02期

关键词：

D O I：

10.1116/1.590556

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A 300-nm-thick diamondlike carbon (DLC) film was deposited on to a heavily doped n-type Si (111) wafer by filtered are deposition. A flat thin film cylindrical emitter array was then fabricated by reactive-ion etching the DLC film. Its electron field emission properties were studied using a simple diode structure. A field emission current of 0.1 mu A was detected under an electric field of 5.2 V/mu m. As large as 64.1 mA/cm(2) of field emission current density was achieved after an activation process under a 39 V/mu m field. An image formed on the anode screen showed that electron field emission from the DLC flat emitter array is rather uniform. The field emission behavior is also consistent with Fowler-Nordheim theory. Hydrogen plasma surface treatments were found to enhance the field emission properties. (C) 1999 American Vacuum Society. [S0734-211X(99)09002-2].

引用

页码：311 / 314

页数：4

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