High-performance p-i-n Ge on Si photodetectors for the near infrared: From model to demonstration

被引:107
作者
Masini, G [1 ]
Colace, L
Assanto, G
Luan, HC
Kimerling, LC
机构
[1] Terza Univ Rome, Dept Elect Engn, I-00146 Rome, Italy
[2] Terza Univ Rome, Natl Inst Phys Matter, INFM, RM3, I-00146 Rome, Italy
[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
基金
美国国家科学基金会;
关键词
heterojunctions; integrated optoelectronics; optical communications; photodetectors;
D O I
10.1109/16.925232
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated the integration of Ge p-i-n and n-i-p heterojunction photodiodes on Si. Recognizing the crucial role of interface defects at the Ge/Si interface on the performance of photodetectors, we have designed and fabricated high-performance n-i-p Ge photodiodes on p(+)-Si substrates. These photodiodes exhibit short-circuit responsivities of 0.3 and 0.2 A/W at 1.3 and 1.55 mum, respectively, reverse dark currents of 20 mA/cm(2) and response times of 800 ps.
引用
收藏
页码:1092 / 1096
页数:5
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