Structural transformation in the 90° partial dislocation in Si due to Ga impurities

被引:3
作者
Kaplan, T [1 ]
Mostoller, M
Chisholm, MF
机构
[1] Oak Ridge Natl Lab, Div Math & Comp Sci, Oak Ridge, TN 37831 USA
[2] Oak Ridge Natl Lab, Div Solid State, Oak Ridge, TN 37831 USA
来源
PHYSICAL REVIEW B | 1998年 / 58卷 / 19期
关键词
D O I
10.1103/PhysRevB.58.12865
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ga impurities in the 90 degrees Shockley partial dislocation in silicon have been investigated using first-principles total-energy pseudopotential calculations. The results indicate that Ga segregates to the core of the dislocation and destabilizes the asymmetric fourfold coordinated structure, which is known to be the low-energy configuration in pure Si. The segregation energy for Ga in the symmetric core configuration is 0.53 eV/atom. The atomic mechanism for this spontaneous transformation to the symmetric structure is the passivation of quasifive-fold sites in the symmetric core by Ga. [S0163-1829(98)01744-5].
引用
收藏
页码:12865 / 12867
页数:3
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