Substantial Crystalline Topology in Amorphous Silicon

被引:64
作者
Gibson, J. M. [1 ]
Treacy, M. M. J. [2 ,3 ]
Sun, T. [1 ]
Zaluzec, N. J. [4 ]
机构
[1] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA
[2] Arizona State Univ, Dept Phys, Tempe, AZ 85287 USA
[3] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[4] Argonne Natl Lab, Div Mat Sci, Ctr Electron Microscopy, Argonne, IL 60439 USA
关键词
MEDIUM-RANGE ORDER; FLUCTUATION MICROSCOPY; PROBE;
D O I
10.1103/PhysRevLett.105.125504
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Using electron correlograph analysis we show that coherent nanodiffraction patterns from sputtered amorphous silicon indicate that there is more local crystallinity in unannealed amorphous silicon than was previously suspected. By comparing with simulations for various models we show that within a typical unannealed amorphous silicon film a substantial volume fraction (> 50%) is topologically crystalline with correlation lengths up to 2 nm. Electron correlograph analysis is a variant of the fluctuation electron microscopy technique and its sensitivity to local crystalline ordering is derived from its sensitivity to four-body correlations.
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页数:4
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