Crystal orientation dependence of p-type contact resistance of GaN

被引:5
作者
Mochida, N
Honda, T
Shirasawa, T
Inoue, A
Sakaguchi, T
Koyama, F
Iga, K
机构
[1] Tokyo Inst Technol, Precis & Intelligence Lab, Midori Ku, Yokohama, Kanagawa 226, Japan
[2] Kohgakuin Univ, Dept Elect Engn, Hachioji, Tokyo 192, Japan
关键词
GaN; crystal orientation; contact resistance; tunnelling model; ohmic contact;
D O I
10.1016/S0022-0248(98)00269-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The crystal orientation dependence in the p-type contact resistance of wurtzite GaN is theoretically investigated by considering the k-directional dependence of hole effective masses for the first time. The current-voltage characteristics of a metal-GaN junction has been calculated by using the so-called tunnelling model which includes both heavy- and light-hole transports. The obtained result suggests that the p-type contact resistance will be reduced when [1 0 (1) over bar 0] and [0 1 0 0] faces are properly used for contact interfaces. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:716 / 719
页数:4
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