Hardness of electron beam deposited titanium carbide films on titanium substrate

被引：13

作者：

Ferro, D

Scandurra, R

Latini, A

Rau, JV

Barinov, SM

机构：

[1] CNR, Inst Studio Mat Nanostrutturati, I-00185 Rome, Italy

[2] Univ Roma La Sapienza, I-00185 Rome, Italy

[3] Inst Phys Chem Ceram RAS, Moscow 119361, Russia

来源：

JOURNAL OF MATERIALS SCIENCE | 2004年 / 39卷 / 01期

关键词：

D O I：

10.1023/B:JMSC.0000007767.87299.84

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

The hardness of electron beam deposited (EBD) titanium carbide films onto Ti substrates was studied. It was found that high temperature of substrate pre-heating results in decreasing hardness of titanium carbide film onto titanium substrate. Even at the substrate pre-heating temperature of about 200°C, the hardness of EBD titanium carbide was found to be lower than that of bulk TiC ceramics.

引用

页码：329 / 330

页数：2

共 13 条

[1]

ANDRIEWSKI RA, 1989, STRENGTH REFRACTORY, P28

[2]

Hardness of hafnium carbide films deposited on silicon by pulsed laser ablation [J].