Structures of Si and Ge nanowires in the subnanometer range

被引:75
作者
Kagimura, R [1 ]
Nunes, RW [1 ]
Chacham, H [1 ]
机构
[1] Univ Fed Minas Gerais, ICEX, Dept Fis, BR-31270901 Belo Horizonte, MG, Brazil
关键词
D O I
10.1103/PhysRevLett.95.115502
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report an ab initio investigation of several structures of pristine Si and Ge nanowires with diameters between 0.5 and 2.0 nm. We consider nanowires based on the diamond structure, high-density bulk structures, and fullerenelike structures. Our calculations indicate a transition from sp(3) geometries to structures with higher coordination, for diameters below 1.4 nm. We find that diamond-structure nanowires are unstable for diameters smaller than 1 nm, undergoing considerable structural transformations towards amorphouslike wires. For diameters between 0.8 and 1 nm, filled-fullerene wires are the most stable. For even smaller diameters (similar to 0.5 nm), we find that a simple hexagonal structure is particularly stable for both Si and Ge.
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页数:4
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